Microwave plasma chemical vapor deposition system based on multi-antenna coupling technology

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Chemical vapor deposition is a method in which several gases are thermochemically reacted at a high temperature to form a solid. Plasma chemical vapor deposition is a solid method in which a working substance is excited into a plasma state by energy excitation to initiate a chemical reaction. Because the plasma has high energy density and high active ion concentration, it can induce physical and chemical changes that cannot or are difficult to achieve in conventional chemical reactions, and has the advantages of low deposition temperature, low energy consumption, no pollution, and the like. Chemical vapor deposition has been widely used.

Microwave plasma also has the advantages of clean plasma and low impurity concentration. Microwave plasma chemical vapor deposition (MPCVD) is the preferred method for preparing high quality diamonds. It is also the most promising high quality diamond (single crystal and many One of the crystal deposition methods.

Microwave plasma chemical vapor deposition system based on multi-antenna coupling technology

MPCVD equipment reaction chamber schematic

Diamond has excellent mechanical, electrical, optical, thermal and acoustic properties and is used in a wide range of applications. The realization of these uses is highly dependent on high orientation and single crystal diamond as well as large area transparent diamond films. Due to the common defects in the diamond growth process and the difficulty in obtaining parameters such as uniform temperature field over a large area, the orientation of the diamond changes, making it difficult to obtain high orientation and single crystal diamond and large area transparent diamond film. Therefore, the biggest challenge and difficulty facing diamond research at present is how to prepare high quality single crystal and polycrystalline diamond samples.

Based on CYRANNUS® multi-antenna coupling patented technology, iplas Germany solves the limitations of traditional single-antenna plasma technology. CYRANNUS® technology uses an extra-cavity multi-antenna setup to ensure that the plasma mass is stably generated in the center of the cavity, reducing the source of impurities and increasing the purity of the crystal (the purity of the prepared diamond single crystal can be above the VVS level).

Microwave plasma chemical vapor deposition system based on multi-antenna coupling technology

MPCVD system for jewellery diamonds

At the same time, the stable microwave generator is also easy to control. It can excite high-stability plasma clusters from 10 mbar to room pressure, minimizing changes in plasma state caused by fluctuations in airflow, gas pressure, gas composition, voltage and other factors. In order to ensure the continuity of single crystal growth, it provides a powerful guarantee for the synthesis of large-size single crystal diamond and film.

Microwave plasma chemical vapor deposition system based on multi-antenna coupling technology

MPCVD system can synthesize high quality large size diamond film

MPCVD is also suitable for thin film deposition and crystal synthesis of planar substrates, or other hard materials such as Al2O3, c-BN. With decades of experience in plasma technology, iplas can provide users with highly customized equipment to meet different application needs of users.

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