Use of heavy ion microporous technology to prevent altered prints

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Patent name: Printed materials protected against alteration by heavy ion micropore technology Patent application number No. 200320122071.6 Publication number: 2650982
Application Date 2003.1 I .2l Publication Date: 2004.10.27
Applicant: Beijing Tsinghua Touchstone New Technology Co., Ltd. This utility model technology belongs to the field of anti-counterfeiting technology and relates to printed matter that resists alteration by using heavy ion micropore technology. Including the order of layers. Combine one made print and heavy ion microporous film layer. The anti-counterfeiting performance of this utility model print can be seen at a glance once it has been altered.


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